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High Vacuum System Evaporation Vacuum Coating Machine with PLC Control for Multi-layer Coating

Guangdong Zhongda Vacuum Equipment Co., Ltd.
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High Vacuum System Evaporation Vacuum Coating Machine with PLC Control for Multi-layer Coating

Brand Name : Zhongda

Model Number : CE

Place of Origin : Zhaoqing, Guangdong

MOQ : 1

Delivery Time : 45-60 work days

Coating : TiO2,Ti3O5, H4, ZrO2, ZnS, Al2O3, MgF2, SiO2, Au, Ag, Cu, Al, Ti, In, Sn

Chamber materia : 304 stainless steel

Coating Structure : Single Layer, Multi-layer, Gradient, Etc.

Machine Size : Customizable

Vacuum System : high

Control System : PLC

Coating Thickness : adjustable

Structure : Vertical front door structure

Rotational speed : 10 to 30RPM (variable)

Coating Environment : NO DUST

Coating Source : Arc Evaporation

Condition : New

Working Theory : Thermal Evaporation

Vacuumdegree : 1x10^-5 to 5x10^-6 Torr

Application : Optical Coatings, Decorative Coatings, Electronic Components

Rotation Stand : 2 Sets

Coating Temperature : ≤200℃

Rotation System : 2 Sets

Productname : Evaporation Vacuum Coating Machine

Coating Transparency : High

Coating Application : Decorative, Functional, Protective

Weight : Around 500 kg

Powersupply : AC 220V/380V, 50/60Hz

Substratesize : Up to 600mm diameter or customized

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Evaporation Vacuum Coating Machine
A precision vacuum coating system designed for producing high-quality multilayer optical films on glass, PC, and PMMA substrates through advanced evaporation technology.
Key Features
  • Central rotation substrate umbrella frame minimizes vibration and particle generation for stable operation
  • Electron beam heating method without electrode plates enables stable multi-layer film formation
  • Proprietary ratio control method with multi-point online monitoring for high-precision optical films
  • Removable substrate umbrella frame with easy lift operation
  • Ion source with uniform high ion current density and dual electron guns for 100+ layer plating capability
  • Fully automated evaporation process with bell jar or planetary workpiece rack options
  • Customizable component configuration to meet specific customer requirements
System Configuration
Fixture System Rotating umbrella frames with single or split configuration
Heating System Halogen lamp/armored heater with temperature up to 350℃
Exhaust System Low vacuum pump set + high vacuum pump set + cryogenic pump/Polycold
Vacuum Control Vacuum controller with Panning and Pirani vacuum gauges
Coating System Electron gun, oxygen-free copper crucible, impedance evaporation source, RF/Kaufman/Hall type ion source
Inflation System MFC or APC automatic pressure controller
Film Thickness Control Crystal controlled or light controlled monitoring
Control System PC + PLC integrated automation
Application Performance
Anti-Reflective (AR) Film Coating:
  • Glass substrate transmittance > 91.5%
  • 420-680nm band: Single side average transmittance > 95%, reflectance < 0.5%
  • Both sides average transmittance > 98%, reflectance < 0.5%
Operational Advantages
  • Increased deposition rates for higher production output
  • High-precision processing capabilities for semiconductor, optoelectronics, and photonics applications
  • Durable construction with easy maintenance requirements
This evaporation vacuum coating machine combines multiple advanced components to deliver superior multilayer film quality while meeting specific customer production needs.

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