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Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications

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Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications

Brand Name : Zhongda

Certification : CE

Place of Origin : Zhaoqing, Guangdong

MOQ : 1

Delivery Time : 45-60 work days

Control System : Full Auto, Semi Auto, Manual

Coating Process : Vacuum Evaporation

Rotation Stand : 2 Sets

Server : openresty

Dimensions : Approx. 2000mm x 1500mm x 1800mm

Cooling Method : Water Cooling

Coating Transparency : High

Coating Thickness : Adjustable

Chamber Material : Stainless Steel Or Carbon Steel

Pumptype : Rotary vane pump + diffusion pump

Voltage : 380V, 50Hz or Custom Made

Coating Technology : Evaporation

Coating Temperature : adjustable

Evaporation Power Supply : 1 Set

Rotation System : 2 Sets

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Small Electron Beam Evaporation Coating Machines
Core Technical Specifications
Parameter Category Details
Substrate Capacity Max size: Up to 6-inch (150mm); Compatible with 2"/4"/6" wafers/optical components; Min size: 10×10mm
Vacuum Performance Ultimate vacuum: ≤ 1×10⁻⁶ Torr (1.3×10⁻⁴ Pa); Pumping time: minutes to 5×10⁻⁶ Torr; Leak rate: 10⁻³ Pa*L/s (He leak test)
Evaporation System Electron beam power: 250W-10kW; Number of crucibles/pockets: 4-8; Supports rod (max φ4mm) & crucible (1-15cc) feedstock
Process Control Substrate temperature: RT-500℃ (±1℃ precision); Rotation speed: 2-20 rpm; Film thickness monitor: QCM (0.01 nm/s resolution)
Film Quality Uniformity: ±1%-±3%; Adhesion: Meets ASTM D3359 4B standard; Deposition rate: 0.1-10 nm/s
Compatibility Materials: Au, Ag, Pt, W, SiO₂, TiO₂, MgF₂, YF₃, ZrO₂ (supports AR/AF/reflective films)
Physical Dimensions Footprint: 1-3.3×3.0m; Height: 2.5-3.5m; Weight: <800kg (desktop/tabletop models)
Power Supply Single/Three-phase: 220V/380V, 50/60Hz; Power consumption: 1.2kW-10kW
Key Advantages
Compact & Space-Saving Design
  • Desktop/modular structure with Korvus HEX-800 standard, ideal for laboratory/research settings
  • Easy integration with glove boxes for inert-atmosphere processes
  • Lightweight construction and tool-free module replacement reduce installation & maintenance costs
High-Precision & Reliable Coating
  • Electron beam focusing technology enables deposition of refractory metals (Pt, W) and dielectric materials
  • 0.01nm/s thickness control with film uniformity ±1% (industry-leading for small-scale equipment)
  • Hall ion source + Ar plasma pre-cleaning enhances film adhesion (4B grade) and density
  • Meets optical component performance requirements (e.g., AR films with >95% transmittance)
Versatile & Flexible Process Adaptation
  • Supports 4-8 crucibles/pockets for multi-material co-evaporation
  • Quick switch between metal, oxide, and organic films (AF/AR/reflective/protective coatings)
  • Compatible with 2"-6" substrates (wafers, lenses, optical fibers)
  • Customizable fixtures (dome/knudzin/plate) for 2D/3D components
Intelligent & User-Friendly Operation
  • PLC + touchscreen control system with real-time process monitoring
  • Pre-programmed process libraries for quick setup
  • Energy-efficient cryopump/magnetic suspension molecular pump design reduces power consumption by 30% vs. traditional systems
Cost-Effective for R&D & Small-Batch Production
  • Low initial investment with high target utilization rate (>70%) and minimal material waste
  • Suitable for prototyping to small-batch manufacturing (up to 10,000 pieces/year)
  • Multi-functional integration (e-beam evaporation + sputtering optional) eliminates need for multiple devices
Core Functions
Precise Heating and Evaporation
  • High-energy electron beams bombard target material surfaces, heating to molten or evaporated state
  • Concentrated energy and high thermal efficiency enable evaporation of refractory materials (tungsten, molybdenum, titanium, SiO₂, TiO₂)
  • Avoids contamination of target material by heating source
  • Supports multi-target material switching (2-6 crucible positions) for continuous deposition of single-layer and multi-layer films
Precise Film Thickness Control
  • Built-in quartz crystal film thickness monitor for real-time deposition rate and thickness monitoring
  • Control accuracy to nanometer level (±0.1nm) for ultra-thin functional films
  • Programmable control system with preset deposition parameters (electron beam power, vacuum degree, deposition rate)
  • Automated coating ensures batch film layer consistency
High Vacuum Environment Guarantee
  • Mechanical pump + molecular pump vacuum unit reduces cavity to 10⁻⁴~10⁻⁶ Pa high vacuum environment
  • Reduces gas molecule scattering and contamination of evaporated particles
  • Ensures film layers have high purity, good density and strong adhesion
Small-Sized Workpiece Adaptation
  • Designed specifically for small workpieces with rotary workpiece table
  • Improves coating layer uniformity across substrates
  • Suitable for substrates ranging from millimeters to tens of millimeters (wafers, optical lenses, chips, sensor components)
  • Supports coating of surface mount, sheet, and small parts

Product Tags:

small electron beam evaporation machine

      

optical coating PVD equipment

      

electron gun coating machine

      
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